Si3N4 is a new type of high temperature structure ceramic material with excellent chemical properties, good thermal shock resistance, low temperature creep, non-wetting to a variety of non-ferrous metal melt, high hardness, self-lubrication, has been widely used in cutting tools, metallurgy, aviation, chemical and other industries.

Silicon nitride can also be applied to thin-film solar cells. After the silicon nitride film is plated by the PECVD method, not only can the reflection of incident light be reduced, but also, in the deposition process of the silicon nitride film, the hydrogen atoms of the reaction product enter the silicon nitride film and the silicon wafer to passivate The role of defects.