Faahfaahin:
Magaca | Cerium(IV) oxide, Ceric Dioxide, Cerium oxide nanopowder |
Formula | CeO2 |
CAS Maya. | 1306-38-3 |
Cabbirka Qaybta | 50nm |
daahirnimo | 99.9% |
Muuqashada | budo huruud ah oo khafiif ah |
Xidhmada | 1kg,5kg halkii bac ama sida loo baahdo |
Codsiyada ugu muhiimsan | Catalyst, polishing, additives, ultraviolet abosorbent, iwm. |
Kala firdhiso | waa la habeyn karaa |
Sharaxaad:
Codsiga cerium dioxide/CeO2 nanoparticle:
(1) Ceric dioxide nanopowder ee polishing: Nano cerium oxide hadda waa kuwa ugu badan ee la isticmaalo abrasive for polishing galaas.Waxaa si weyn loogu isticmaalaa habaynta saxda ah ee muraayadaha iyo qaybaha indhaha waxaana si weyn loo darsay.Maxaa saameeya saamaynta polishing ee budada polishing waa xajmiga walxaha, nadiifnimada iyo adkaanta CeO2.Cabbirka walxaha ayaa ah qodobka ugu weyn.Cabbirka walxaha waaweyni wuxuu ku habboon yahay nadiifinta qaybaha caadiga ah ee indhaha iyo muraayadaha muraayadaha, halka cabbirka qaybta yar uu ku habboon yahay muraayadaha xawaaraha sare ee muraayadaha indhaha.
Tusaale ahaan: Maaddada ugu caansan iyo walxaha aasaasiga ah, muraayadda waxaa si weyn loogu isticmaalaa qalabka qalin-jabinta kumbuyuutarka ee qalabka adag ee muraayadaha, chips camera digital, lenses ultra-sax ah, muraayadaha indhaha iyo qaybaha kale ee indhaha, iyo sidoo kale qaybaha isgaarsiinta indhaha. bandhigyada flat-panel iyo kuwa kale ee elektiroonigga ah ee horumarsan.Qalafsanaan aadka u jilicsan, nanometer-hoosaadka, dusha muraayadda siman oo aan lahayn cillado yaryar ayaa noqday arrin muhiim ah oo la xidhiidha waxqabadka alaabtan tiknoolajiyada sare leh.Naaxinta farsamada kiimikada (CMP) waa qayb muhiim ah oo ka mid ah farsamaynta wafer silikoon iyo dhammaan habka dhigista iyo xoqidda ee soo saarista wareegyada isku dhafan.Waxay isticmaashaa saamaynta silxinta makaanikada ah ee walxaha abrasive ultrafine ee ku jira slurry CMP iyo saamaynta daxalka kiimikada ee slurry.Saxanka indhaha waxa uu ka samaysan yahay dusha sare oo fidsan maraqa silikoon kaas oo qaabka wareegga lagu sameeyay.Hadda waa tignoolajiyad cusub oo bixin karta fidinta caalamiga ah ee habka wax soo saarka ee wareegyada VLSI.
(2) Nano-cerium dioxide ee loo isticmaalo kicinta ayaa leh waxqabad dib-u-celin wanaagsan.Cerium oxide nanopowder kaliya ma leh kaydka oksijiinta u gaarka ah iyo hawlaha sii daynta ogsijiinta, laakiin sidoo kale waa kicinta oksaydhka ugu firfircoon ee taxanaha ogsaydhka dhulka naadir ah.Sidaa darteed, nano ceria waxaa loo isticmaali karaa sidii wakiil caawiye ah si loo hagaajiyo waxqabadka kicinta ee kicinta marar badan.
(3) Ceric oxide nano particle loo isticmaalo warshadaha birta: Isticmaalka nano-cerium oxide sida daahan iyo wax lagu daro waxay hagaajin kartaa iska caabbinta oksaydhka, daxalka kulul, daxalka biyaha iyo sifooyinka vulcanization ee alloys heerkul sare ah iyo birta, iyo sidoo kale waxay noqon kartaa loo isticmaalo tallaalka birta ductile.
(4) Cerium oxide nano budada waxaa loo isticmaali karaa alaabada nuugta ultraviolet sababtoo ah nano CeO2 wuxuu leeyahay heerar badan oo tamar ah oo elektaroonik ah, dareenka indhaha ee ugu fiican ee nuugista iftiinka ultraviolet.Marka lagu daro saamaynta cabbirka yar, saamaynta dusha sare ee gaarka ah, iyo saamaynta quantum ee macroscopic ee nanoparticle, CeO2 nano waxay leedahay saameyn xoog leh oo kala firdhiso iyo saamaynta iftiinka ultraviolet.Intaa waxaa dheer, CeO2 waxay leedahay xasilooni kulayl wanaagsan, badbaado iyo sun la'aan, kheyraad badan, iyo kharashka diyaarinta oo hooseeya, sidaas darteed waxaa la filayaa inay noqoto nooc cusub oo nuuga ultraviolet ah oo lagu dabaqo meelo kala duwan.
Xaaladda Kaydinta:
Nano Cerium(IV) oxide/CeO2 Budada Cerium oxide waa in lagu kaydiyaa meel xidhan, ka fogow nalka, meel qalalan.Kaydinta heerkulka qolku waa ok.