Inkcazo:
Igama | I-Cerium (IV) i-oxide, i-Ceric Dioxide, i-Cerium oxide nanopowder |
Ifomula | CeO2 |
Inombolo yeCAS. | 1306-38-3 |
Ubungakanani beNcam | 50nm |
Ubunyulu | 99.9% |
Imbonakalo | Umgubo otyheli okhanyayo |
Iphakheji | 1kg, 5kg ingxowa nganye okanye njengoko kufuneka |
izicelo eziphambili | I-Catalyst, ipolishi, izongezo, i-ultraviolet abosorbent, njl. |
Ukusasazwa | Inokwenziwa ngokwezifiso |
Inkcazo:
Ukusetyenziswa kwecerium dioxide/CeO2 nanoparticle:
(1) I-Ceric dioksidi nanopowder yokupholisha: I-Nano cerium oxide okwangoku yeyona isetyenziswa ngokuxhaphakileyo kwi-abrasive yokupholisha iglasi. Isetyenziswa ngokubanzi kulungiso oluchanekileyo lweglasi kunye nezinto ezibonakalayo kwaye ifundwe ngokubanzi. Yintoni echaphazela umphumo wokupolisha kwipowder yokupholisa ubukhulu beqhekeza, ubumsulwa kunye nobunzima be-CeO2. Ubungakanani bamasuntswana yeyona nto iphambili. Ubungakanani be-particle enkulu bufanelekile ukupoliswa kwezinto eziqhelekileyo ze-optical kunye ne-spectacle lens, ngelixa i-particle encinci ifanelekile kwi-high-speed polishing ye-fine optical lens.
Umzekelo: Njengeyona nto ixhaphakileyo kunye nesisiseko sezinto ezingaphiliyo, iglasi isetyenziswa kakhulu kwipen-notebook yekhompyuter ye-hard disk substrates zeglasi, iichips zekhamera yedijithali, iilensi ze-ultra-precision optical, iifestile zamehlo kunye nezinye izinto ezibonakalayo, kunye namacandelo onxibelelwano optical, imiboniso ye-flat-panel kunye nezinye i-electronics eziphambili. I-Ultra-smooth, i-sub-nanometer roughness, i-glass flat surface ngaphandle kwe-micro-defects ibe yinto ebalulekileyo enxulumene nokusebenza kwezi mveliso eziphezulu. I-Chemical mechanical polishing (CMP) yinxalenye ebalulekileyo ye-silicon wafer processing kunye nenkqubo yonke yokubeka kunye ne-etching kwimveliso yeesekethe ezidibeneyo. Isebenzisa i-mechanical polishing effect ye-ultrafine abrasive particles kwi-slurry ye-CMP kunye nefuthe le-chemical corrosion ye-slurry. I-optical disc yenza umphezulu othe tyaba kakhulu kwi-silicon wafer apho ipateni yesekethe yenziwe khona. Okwangoku bubuchwephesha obutsha obunokubonelela ngokutyalwa kwehlabathi jikelele kwinkqubo yokwenziwa kweesekethe zeVLSI.
(2) I-Nano-cerium dioxide esetyenziselwa i-catalyst inokusebenza kakuhle kwe-redox. I-Cerium oxide nanopowder ayinayo kuphela i-oksijini yokugcina i-oksijini kunye nemisebenzi yokukhutshwa kwe-oksijini, kodwa ikwayeyona nto isebenzayo i-oxide catalyst kuthotho lwe-oxide yomhlaba enqabileyo. Ngoko ke, i-nano ceria ingasetyenziselwa njenge-arhente encedisayo ukuphucula ukusebenza kwe-catalytic ye-catalyst kwiimeko ezininzi.
(3) I-Ceric oxide nano particle esetyenziswa kwi-industry yensimbi: Ukusebenzisa i-nano-cerium oxide njengento yokugqoka kunye neyongeziweyo kunokuphucula ukuxhathisa i-oxidation, i-corrosion eshushu, i-corrosion yamanzi kunye neempawu ze-vulcanization ze-alloys eziphezulu zokushisa kunye nensimbi engenasici, kwaye ingaba nayo. isetyenziswe njenge-inoculant ye-iron ductile.
(4) I-Cerium oxide nano powder ingasetyenziselwa kwiimveliso zokufunxa i-ultraviolet ngenxa yokuba i-nano CeO2 inamanqanaba amaninzi okutshintsha kwe-elektroniki, i-optical sensitivity egqwesileyo kwi-ultraviolet ukukhanya. Idityaniswe nesiphumo sobungakanani obuncinci, isiphumo esicacileyo somgangatho ophezulu, kunye nesiphumo se-macroscopic quantum ye-nanoparticle, i-CeO2 nano inokusasazwa okunamandla kunye neziphumo zokubonisa ekukhanyeni kwe-ultraviolet. Ngaphezu koko, i-CeO2 inozinzo oluhle lwe-thermal, ukhuseleko kunye nokungabikho kwetyhefu, izibonelelo ezininzi, kunye neendleko eziphantsi zokulungiselela, ngoko ke kulindeleke ukuba ibe luhlobo olutsha lwe-ultraviolet absorber esetyenziswa kwiinkalo ezahlukeneyo.
Imeko yoGcino:
I-Nano Cerium (IV) i-oxide / CeO2 I-Cerium oxide powder kufuneka igcinwe etywinwe, igweme ukukhanya, indawo eyomileyo. Ukugcinwa kobushushu begumbi kulungile.