Nano Cerium(IV) oxide, Ceric Dioxide Nanoparticle 50nm CeO2 Cerium oxide Ukumenyezwa
Nano Cerium(IV) oxide, Ceric Dioxide Nanoparticle 50nm CeO2 Cerium oxide Ukumenyezwa
Inkcazo:
| Igama | I-Cerium (IV) i-oxide, i-Ceric Dioxide, i-Cerium oxide nanopowder |
| Ifomula | CeO2 |
| Inombolo yeCAS. | 1306-38-3 |
| Ubungakanani beNcam | 50nm |
| Ubunyulu | 99.9% |
| Imbonakalo | Umgubo otyheli okhanyayo |
| Iphakheji | 1kg, 5kg ingxowa nganye okanye njengoko kufuneka |
| izicelo eziphambili | I-Catalyst, ipolishi, izongezo, i-ultraviolet abosorbent, njl. |
| Ukusasazwa | Inokwenziwa ngokwezifiso |
Inkcazo:
Ukusetyenziswa kwecerium dioxide/CeO2 nanoparticle:
(1) I-Ceric dioksidi nanopowder yokupholisha: I-Nano cerium oxide okwangoku sesona sixhobo sisetyenziswa ngokuxhaphakileyo sokuthambisa iglasi.Isetyenziswa ngokubanzi kulungiso oluchanekileyo lweglasi kunye namalungu optical kwaye ifundwe ngokubanzi.Yintoni echaphazela umphumo wokupholisa kwipowder yokupholisa ubukhulu becala, ubumsulwa kunye nobunzima be-CeO2.Ubungakanani bamasuntswana yeyona nto iphambili.Ubungakanani be-particle enkulu bufanelekile ukupoliswa kwezinto eziqhelekileyo ze-optical kunye ne-spectacle lens, ngelixa i-particle encinci ifanelekile kwi-high-speed polishing ye-fine optical lens.
Umzekelo: Njengeyona nto ixhaphakileyo kunye nesisiseko sezinto ezingaphiliyo, iglasi isetyenziswa kakhulu kwipen-notebook yekhompyuter ye-hard disk substrates zeglasi, iichips zekhamera yedijithali, iilensi ze-ultra-precision optical, iifestile zamehlo kunye nezinye izinto ezibonakalayo, kunye namacandelo onxibelelwano optical, imiboniso ye-flat-panel kunye nezinye ii-electronics eziphambili.I-Ultra-smooth, i-sub-nanometer roughness, i-glass flat surface ngaphandle kwe-micro-defects ibe yinto ebalulekileyo enxulumene nokusebenza kwezi mveliso eziphezulu.I-Chemical mechanical polishing (CMP) yinxalenye ebalulekileyo ye-silicon wafer processing kunye nenkqubo yonke yokubeka kunye ne-etching kwimveliso yeesekethe ezidibeneyo.Isebenzisa i-mechanical polishing effect ye-ultrafine abrasive particles kwi-slurry ye-CMP kunye nefuthe le-chemical corrosion ye-slurry.I-optical disc yenza umphezulu othe tyaba kakhulu kwi-silicon wafer apho ipateni yesekethe yenziwe khona.Okwangoku bubuchwephesha obutsha obunokubonelela ngokutyalwa kwehlabathi jikelele kwinkqubo yokwenziwa kweesekethe zeVLSI.
(2) I-Nano-cerium dioxide esetyenziselwa i-catalyst inokusebenza kakuhle kwe-redox.I-Cerium oxide nanopowder ayinayo kuphela i-oksijini yokugcina i-oksijini kunye nemisebenzi yokukhutshwa kwe-oksijini, kodwa ikwayeyona nto isebenzayo i-oxide catalyst kuthotho lwe-oxide yomhlaba enqabileyo.Ngoko ke, i-nano ceria ingasetyenziselwa njenge-arhente encedisayo ukuphucula ukusebenza kwe-catalytic ye-catalyst kwiimeko ezininzi.
(3) I-Ceric oxide nano particle esetyenziswa kwi-industry yensimbi: Ukusebenzisa i-nano-cerium oxide njengento yokugqoka kunye neyongeziweyo kunokuphucula ukuxhathisa i-oxidation, i-corrosion eshushu, i-corrosion yamanzi kunye neempawu ze-vulcanization ze-alloys eziphezulu zokushisa kunye nensimbi engenasici, kwaye ingaba nayo. isetyenziswe njenge-inoculant ye-iron ductile.
(4) I-Cerium oxide nano powder ingasetyenziselwa kwiimveliso zokufunxa i-ultraviolet ngenxa yokuba i-nano CeO2 inamanqanaba amaninzi okutshintsha kwe-elektroniki, i-optical sensitivity egqwesileyo kwi-ultraviolet ukukhanya.Idityaniswe nesiphumo sobungakanani obuncinci, isiphumo esicacileyo somgangatho ophezulu, kunye nesiphumo se-macroscopic quantum ye-nanoparticle, i-CeO2 nano inokusasazwa okunamandla kunye neziphumo zokubonisa ekukhanyeni kwe-ultraviolet.Ngaphezu koko, i-CeO2 inozinzo oluhle lwe-thermal, ukhuseleko kunye nokungabikho kwetyhefu, izibonelelo ezininzi, kunye neendleko eziphantsi zokulungiselela, ngoko ke kulindeleke ukuba ibe luhlobo olutsha lwe-ultraviolet absorber esetyenziswa kwiinkalo ezahlukeneyo.
Imeko yoGcino:
I-Nano Cerium (IV) i-oxide / CeO2 I-Cerium oxide powder kufuneka igcinwe etywinwe, igweme ukukhanya, indawo eyomileyo.Ukugcinwa kobushushu begumbi kulungile.
I-SEM :
