Ukucaciswa:
Igama | I-Cerium(IV) i-oxide, i-Ceric Dioxide, i-Cerium oxide nanopowder |
Ifomula | CeO2 |
Inombolo ye-CAS. | 1306-38-3 |
Usayizi Wezinhlayiyana | 50nm |
Ubumsulwa | 99.9% |
Ukubukeka | Impushana ephuzi ekhanyayo |
Iphakheji | 1kg, 5kg isikhwama ngasinye noma njengoba kudingeka |
Izicelo eziyinhloko | I-Catalyst, polishing, izithasiselo, i-ultraviolet abosorbent, njll. |
Ukuhlakazeka | Kungenziwa ngokwezifiso |
Incazelo:
Ukusetshenziswa kwe-cerium dioxide/CeO2 nanoparticle:
(1) I-Ceric dioxide nanopowder yokupholishwa: I-Nano cerium oxide njengamanje iyi-abrasive esetshenziswa kakhulu ukupholisha ingilazi.Isetshenziswa kabanzi ekucutshungulweni okunembayo kwengilazi nezinto ezibonakalayo futhi ifundwe kabanzi.Okuthinta umphumela wokupholisha kumpushana wokupholisha ubukhulu bezinhlayiyana, ubumsulwa nobulukhuni be-CeO2.Ubukhulu bezinhlayiyana buyisici esiyinhloko.Usayizi wezinhlayiyana ezinkulu ulungele ukupholishwa kwezingxenye ezivamile ze-optical namalensi okubuka, kuyilapho usayizi wezinhlayiyana ezincane ulungele ukupholishwa ngesivinini esiphezulu kwamalensi optical amahle.
Isibonelo: Njengezinto ezivame kakhulu neziyisisekelo ze-inorganic, ingilazi isetshenziswa kakhulu kuma-substrates engilazi ye-hard disk yekhompyutha ye-pen-notebook, ama-chips ekhamera yedijithali, ama-lens optical ultra-precision, amafasitela optical nezinye izingxenye ze-optical, kanye nezingxenye zokuxhumana ezibonakalayo, ama-flat-panel display nezinye izinto zikagesi ezithuthukisiwe.Ubushelelezi be-Ultra-smooth, i-sub-nanometer roughness, ingilazi eyisicaba ngaphandle kwamaphutha amancane sekuyinto ebalulekile ehlobene nokusebenza kwale mikhiqizo yobuchwepheshe obuphezulu.I-Chemical mechanical polishing (CMP) iyingxenye ebalulekile yokucutshungulwa kwe-silicon wafer kanye nayo yonke inqubo yokubeka kanye ne-etching ekukhiqizeni amasekethe ahlanganisiwe.Isebenzisa umthelela wokupholisha womshini wezinhlayiya ze-ultrafine abrasive ku-slurry ye-CMP kanye nomthelela wokugqwala kwamakhemikhali we-slurry.I-optical disc yakha indawo eyisicaba kakhulu ku-silicon wafer lapho iphethini yesifunda yenziwe khona.Njengamanje ubuchwepheshe obusha obungahlinzeka ngokufiphaza komhlaba wonke ohlelweni lokukhiqiza amasekethe e-VLSI.
(2) I-Nano-cerium dioxide esetshenziselwa i-catalyst inokusebenza okuhle kwe-redox.I-Cerium oxide nanopowder ayigcini nje ngokugcina i-oxygen eyingqayizivele nemisebenzi yokukhishwa komoya-mpilo, kodwa futhi iyisisusa se-oxide esisebenza kakhulu ochungechungeni lwe-oxide yomhlaba engavamile.Ngakho-ke, i-nano ceria ingasetshenziswa njenge-ejenti eyisizayo ukuze kuthuthukiswe ukusebenza kwe-catalyst ye-catalyst ezikhathini eziningi.
(3) I-Ceric oxide nano particle esetshenziswa embonini yensimbi: Ukusebenzisa i-nano-cerium oxide njenge-coating nesengezo kungathuthukisa ukumelana ne-oxidation, ukugqwala okushisayo, ukugqwala kwamanzi kanye nezakhiwo ze-vulcanization zama-alloys aphezulu okushisa nensimbi engagqwali, futhi kungaba isetshenziswa njenge-inoculant ye-ductile iron.
(4) I-Cerium oxide nano powder ingasetshenziswa emikhiqizweni emunca i-ultraviolet ngoba i-nano CeO2 inamazinga amaningi wamandla okushintsha kwe-elekthronikhi, ukuzwela okuhle kakhulu kwe-optical ekumunceni ukukhanya kwe-ultraviolet.Ihambisana nomphumela kasayizi omncane, umphumela othize ophezulu, kanye nomphumela we-macroscopic quantum we-nanoparticle, i-CeO2 nano inomphumela onamandla wokuhlakazeka nokubonisa ukukhanya kwe-ultraviolet.Ngaphezu kwalokho, i-CeO2 inokusimama okuhle kokushisa, ukuphepha nokungewona ubuthi, izinsiza eziningi, kanye nezindleko eziphansi zokulungiselela, ngakho-ke kulindeleke ukuthi ibe uhlobo olusha lwesimunyisi se-ultraviolet esisetshenziswa emikhakheni ehlukahlukene.
Isimo Sesitoreji:
I-Nano Cerium(IV) oxide/CeO2 I-Cerium oxide powder kufanele igcinwe endaweni evaliwe, gwema ukukhanya, indawo eyomile.Isitoreji sezinga lokushisa legumbi silungile.